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Silicon Flash > Blog > Innovations > Why they don’t fall apart
Innovations

Why they don’t fall apart

Published April 18, 2025 By Juwan Chacko
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Why they don’t fall apart
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Ferroelectric semiconductors have emerged as a groundbreaking new class of chips with the ability to store information using electric fields. This technology has the potential to revolutionize the way computers operate, leading to lower power consumption, sensors with quantum precision, and the seamless conversion of signals between electrical, optical, and acoustic forms.

Despite their incredible potential, ferroelectric semiconductors face a significant challenge – the risk of falling apart under certain conditions. The mystery of how these materials, specifically wurtzite ferroelectric nitrides, are able to maintain two opposing electric polarisations within the same material has puzzled researchers for some time.

A recent study led by engineers at the University of Michigan has shed light on this enigma. The research team, headed by Zetian Mi, the Pallab K. Bhattacharya Collegiate Professor of Engineering, uncovered the key factor that prevents wurtzite ferroelectric nitrides from self-destructing.

One of the key findings of the study was the revelation that polarisation changes in ferroelectric semiconductors occur within domains of original and reversed polarisation, rather than affecting the entire material uniformly. At the interfaces where these domains meet, researchers were perplexed by the absence of physical breaks despite the repulsion between two positive ends.

Through experimental investigations, the team discovered that while there is indeed an atomic-scale break in the material at these interfaces, this break serves as the “glue” that holds the structure together. The fractured crystal structure at the joint generates dangling bonds containing negatively charged electrons, which effectively balance the excess positive charge present at the edges of each domain within the ferroelectric semiconductors.

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The unique atomic arrangement observed at these interfaces presents exciting possibilities for the development of future transistors with conductive channels. Emmanouil Kioupakis, U-M professor of materials science and engineering, highlighted the significance of this discovery, noting that the broken bonds created by the abrupt polarisation change serve as a universal stabilising mechanism in ferroelectric materials.

Further analysis revealed that the atomic structure of the ferroelectric semiconductors consisted of scandium gallium nitride, with the usual hexagonal crystal structure being buckled at the domains’ meeting points. This structural distortion created the broken bonds necessary for stabilisation. Additionally, the electrons within these dangling bonds facilitated the creation of an adjustable “superhighway” for electricity along the joint, offering significantly higher charge carrier density compared to conventional gallium nitride transistors.

The team’s observations have sparked interest in leveraging this technology for field-effect transistors capable of supporting high currents, making them ideal for high-power and high-frequency electronics. Plans are underway to harness this potential and develop innovative applications in the near future.

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